@Article{CapoteaLugGutMasTra:2018:EfAmSi,
author = "Capotea, G. and Lugo Gonz{\'a}lez, Dubrazkha Carolina and
Guti{\'e}rrez, J. M. and Mastrapa, G. C. and Trava-Airoldi,
Vladimir Jesus",
affiliation = "{Universidad Nacional de Colombia} and {Instituto Nacional de
Pesquisas Espaciais (INPE)} and {Universidad Nacional de Colombia}
and {Pontif{\'{\i}}cia Universidade Cat{\'o}lica do Rio de
Janeiro (PUC-Rio)} and {Instituto Nacional de Pesquisas Espaciais
(INPE)}",
title = "Effect of amorphous silicon interlayer on the adherence of
amorphous hydrogenated carbon coatings deposited on several
metallic surfaces",
journal = "Surface and Coatings Technology",
year = "2018",
volume = "344",
pages = "644--655",
month = "June",
keywords = "A-C:H coating, Multilayer, Silicon interlayer, Interface, Active
screen, Adhesion, XPS.",
abstract = "The effect of an amorphous hydrogenated silicon (a-Si:H)
interlayer on the adherence of amorphous hydrogenated carbon
(a-C:H) coatings deposited on four metallic surfaces: AISI M2
steel, AISI 304 stainless steel, Nitinol alloy, and Ti6Al4V alloy
was studied. The interlayers and the coatings were deposited
employing an asymmetrical bipolar pulsed-DC PECVD system with an
active screen. Multilayer a-C:H coatings were also deposited, with
the aim of obtaining thicker films. The interlayers were
synthetized by varying the applied negative pulse amplitude from
\−0.8\ kV to \−10\ kV, keeping their
thickness constant at 250\ nm. The coatings' adhesion was
evaluated using classical scratch and VDI 3198 indentation tests.
Raman spectroscopy was used to analyze the films' atomic
arrangements. The total compressive stress was determined through
the measurement of the substrate curvature before and after the
film deposition, while nanoindentation experiments allowed
determining the films' hardness and elastic modulus. In order to
determine the chemical bonding between a-Si:H and the metallic
surfaces, X-ray photoelectron spectroscopy (XPS) was used. The
obtained results showed high values of critical loads, allowing a
high degree of adherence of the a-C:H coatings to all the metallic
materials. The highest Lc1 critical load values
(\≥25\ N) were determined when the a-Si:H
interlayers were deposited using the highest negative applied
voltage (from \−6\ kV to \−10\ kV) on
the Nitinol alloy surfaces. The XPS results suggested that the
high degree of adhesion of the a-C:H coatings to Nitinol could be
attributed to chemical bonds of TiSi and NiSi formed in the
interface, while for the Ti6Al4V alloy the TiSi bonds
predominated. On the other hand, on steel surfaces the adhesion
was due to FeSi bonds. A combination of a modified pulsed-DC PECVD
system with an active screen and an a-Si:H interlayer allowed
depositing hard, adherent, and low-stress a-C:H coatings.",
doi = "10.1016/j.surfcoat.2018.03.093",
url = "http://dx.doi.org/10.1016/j.surfcoat.2018.03.093",
issn = "0257-8972",
language = "en",
targetfile = "capote_effect.pdf",
urlaccessdate = "27 abr. 2024"
}